Optoelectronics

Rainbow Processing Unit - Coating and Fine Line Imaging of Panels

14th March 2012
ES Admin
0
The Rainbow Process represents a major breakthrough in the coating, imaging and developing of resist in one automated unit.
The unit occupies only 12 sq. m, uses low power, a liquid resist and LED’s for exposure. The unit will deliver a double sided panel (e.g. inner layer) every 15 - 20 seconds ready for etching.



Key to the success of the Rainbow process is the proprietary etch resist which does not require pre-drying before imaging: it is 100% solids and solvent free.



Amazingly, using only UV LED’s and standard photo-tools, lines and spaces (tracks and gaps) of 20 microns are easily achieved.



Developing is with industry standard potassium or sodium bi-carbonate solutions after which the panel is ready for etching.



Changing part numbers is achieved in about 3 minutes or less via a self locating and patented self registering cart system.



The system is built in its own environmentally controlled atmosphere (positive air pressure) and can therefore be operated without sophisticated clean rooms. Handling is automatic reducing labour and also the risk of damage.



Key benefits include:

•Low capital cost (compared to LDI)

•Low running/maintenance costs

•No ovens - No vacuums - No Clean room

•UV LED exposure system - long service life, no heat, no ozone

•No stress to photo tool

•Low power consumption (Average 3kW)

•Competitively priced wet resist (no solvents and no protective Mylar)

•High production output (no dwell time required)

•Fine lines with high yields (20 microns and less)

•Vertical processing for thinner sheet/inner layers

•Full (integral) contamination control environment

•Small footprint (12 sq. m)

•Automatic handling

•Works alongside standard industry processes (Hi-Ho: horizontal in-horizontal out)

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