Samsung uses Anritsu’s RTD & MD8430A to demonstrate LTE Broadcast Capabilities

Samsung has announced today that it has successfully demonstrated clear reception capabilities of LTE Broadcast services using evolved Multimedia Broadcast Multicast Service technology using Anritsu’s Rapid Test Designer and MD8430A to simulate the LTE network environment.

eMBMS technology allows the LTE network infrastructure to be used for the delivery of broadcast services such as TV. It enables carriers to adjust coverage and capacity as needed, allowing for more efficient use of network resources. Samsung Electronics and Anritsu (two long time leaders in new mobile technologies) have collaborated to bring this new technology to market.

Anritsu’s RTD delivers a rich set of test features using its fast and flexible flowcharting user interface. The Samsung engineers were able to create the eMBMS demonstration using RTD’s graphical script design to drive the execution of the test simulation on an Anritsu MD8430A LTE signaling tester.

“Anritsu is delighted that Samsung, the world’s largest cell phone maker, has selected RTD and MD8430A’s technology leading capabilities to verify the implementation of eMBMS capability in its devices”, stated Kenji Tanaka, Executive Vice President at Anritsu. “Samsung’s demonstration shows how Anritsu’s RTD helps LTE device makers to prove their leading-edge technology in an intensely competitive market where reducing the product launch cycle time is critical to success”.

“We have used Anritsu test equipment from the very beginning of our LTE development programs”, said Inyup Kang, Executive Vice President at Samsung Electronics. “Anritsu’s RTD and MD8430A have made a significant contribution to our leading position in the LTE device market”, he added.

Keep Up to Date with the Most Important News

By pressing the Subscribe button, you confirm that you have read and are agreeing to our Privacy Policy and Terms of Use
Previous Post

GaAs MMIC Doubler with Integrated Gain, Self-Biased Doubler and Driver Stages from M/A-COM Tech

Next Post

Patterning defect-free nanocrystal films with nanometer resolution