It is the newest entry in the company’s E3600 series, which has been widely accepted in the photomask SEM market. It enables measurement throughput to be doubled compared with the existing model, the E3640.
A higher throughput enables massive measurement required by more complex patterning and increased number of masks due to multiple patterning.
In addition to leading-edge photomasks, the new tool also demonstrates superior performance when measuring EUV masks and master templates for nanoimprint applications.
The E3650 will be exhibited at SEMICON Japan 2018 in Tokyo (December 12-14).