Tantalum capacitors for implantable medical devices

27th August 2013
Nat Bowers

AVX has today announced the launch of a new series of medical grade tantalum capacitors, the TAZ HRC5000 series. Rated for 4V to 50V and -55ºC to +125ºC, the new high-reliability, medical-grade tantalum capacitor series is specifically designed for use in implantable medical device applications. Featuring a capacitance range of 0.1µF to 330µF, the TAZ HRC5000 capacitors offer extremely low DC leakage limits well below typical industry values.

Available in case sizes ranging from A-H, the TAZ HRC5000 medical grade tantalum series capacitors are also some of the smallest tantalum chip capacitors currently on the market.

The TAZ HRC5000 series is available with several customization options to better suit individual medical and other high-reliability/low-leakage tantalum applications. These include custom DC leakage limits, various plating materials (tin/lead solder, 100% tin, or gold), and standard and low ESR variations, in addition to two reliability verification procedures: Weibull grading and surge current testing per MIL-PRF-55365. The series is also available in bulk, tape and reel, and waffle packaging.

TAZ HRC5000 medical grade tantalum series parts are manufactured and tested at AVX’s ISO 13485-certified, high-reliability tantalum manufacturing facility in Biddeford, Maine. Current lead time for the series is 12 weeks.

Allen Mayar, Tantalum Product Marketing Manager at AVX, comments: “AVX is continually engaged in engineering new solutions based both on customer feedback and the anticipation of our customers’ ever-evolving needs, a practice that has led to our longstanding status as the leading global manufacturer of tantalum capacitors for high-reliability implantable medical devices, among several others. The TAZ HRC5000 series, with its new industry-leading DC leakage standards, application-driven performance specifications, and variety of customization options is just one example of our continuous and highly targeted development efforts."

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