EB lithography on parade in The Hague
EB (electron beam) lithography and MVM-SEM (Multi-Vision Metrology Scanning Electron Microscope) solutions will be showcased by Advantest at the 41st Micro and Nano Engineering Show in The Hague (Sept 21-24). Highlighted products include theF7000 EB lithography system for direct writing of nano-patterns on wafers, the E3310 and E3640 MVM-SEM systems for wafer and mask metrology and the E5610 DR (defect review)-SEM for inspecting next-generation photomasks.
The F7000 EB lithography system delivers high throughput and can create nano-patterns on wafers with 1X-nm resolution. Direct-write technology is suitable as a design tool for research and development as well as on system LSI production lines, where small-lot-multiple-type devices are produced.
The E3310 and E3640 MVM-SEM systems enable real-time, 3D measurement and imaging. For tri-gate processing, the E3310 MVM SEM offers high efficiency for volume production. The E3640 system delivers the industry’s best pattern-measurement capability and high throughput for applications including standard photomasks, EUV photomasks and NIL templates.
The E5610 DR-SEM is designed for reviewing and classifying ultra-small defects in next-generation photomasks and blanks. The system offers highly stable, fully automatic image capturing with the long-term operational stability and reliability essential for manufacturing analyses of critical masks.
Product Spotlight
APV1111GVY
Panasonic
Panasonic PhotoMOS® Photovoltaic MOSFET High-Power Drivers
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| Stock: | 3490 |
| Cost: | $3.95 |
