Analysis

Vacuum plasma systems in nanotechnology research

6th September 2016
Anna Flockett

Successfully integrating two Advanced Vacuum plasma processing systems, is a South Korean research university, from Plasma-Therm into its nanotechnology fabrication lab, this supports multiple users engaged in wide-ranging nanotechnology research. Seoul National University lab researchers recently installed two Apex SLR systems with the well-proven Inductively Coupled Plasma (ICP) source technology from Plasma-Therm.

One system is configured for dry etching, and the second system is configured for High-Density Plasma Chemical Vapour Deposition (HDPCVD).

Jong-Seung Park, Team Manager/Fab Operations of Seoul National University, said the university’s cleanroom facility serves many users who are employing the Apex SLR systems’ etch and deposition capabilities.

Park added: “We are pleased to provide a goof reference for these systems and their support. Both systems operate as we expected and deliver reproducible results over the last 16 months. The systems are reliable and we are pleased to be a customer of Plasma.”

Park said the Apex SLR ICP system utilises chlorine-based chemistries for etching various materials, with an emphasis on aluminium interconnects. The Apex SLR HDPCVD system has been employed for a wide range of silicon oxide and silicon nitride deposition processes, such as trench or gap filling for device fabrication.

Lishan continued: “The ability for facilities like SNU’s to task Apex SLR systems and quickly achieve process specs for multiple users are big reasons for selection of Apex SLR over products that are less capable and more expensive.”

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