Supplying Plasma Systems for Nano Discovery at Notre Dame

FlexAL systems provide a new level of flexibility and capability in the engineering of nanoscale structures and devices by offering remote plasma ALD processes and thermal ALD within a single system. The PlasmaProâ System100 ICP etch system features the new Cobra source which provides the user with additional plasma control capabilities, thereby providing the highest flexibility for advanced processing.

MIND is one of four centers sponsored by the Semiconductor Research Corporation's Nanoelectronics Research Initiative (NRI). Collaborations also link MIND to the National Institute of Standards and Technology, Argonne National Laboratory, and the National High Magnetic Field Laboratory.

Comments Professor Alan Seabaugh of Notre Dame, the Frank M. Freimann director of MIND, “The goal of the NRI centers is to discover and develop the next nanoscale logic device — one with performance capabilities beyond conventional devices, enabling it to become the basic building block of future computers. At Notre Dame, we have chosen Oxford Instruments’ systems to facilitate this work, due to the advanced features they provide; the versatility and cost effectiveness of their systems for research and the support the company offers.”

“Our company aims to pursue responsible development and a deeper understanding of the world through science and technology, and has successfully been a key supplier to many prestigious US research facilities for many years”, says Stuart Mitchell, VP Sales for Oxford Instruments America Inc, “This order for our plasma etch and deposition systems reinforces Oxford Instruments reputation as an important provider to the USA research community, in addition to being a leading supplier to the manufacturing industry.”