Events News

E-beam lithography tool debuts at Semicon Europa

1st October 2014
Mick Elliott
0

Advantest is preparing to exhibit its broad portfolio, including its nanotechnology products, terahertz systems and semiconductor test solutions at SEMICON Europa in Grenoble (October 7-9).  It will highlight its multi-vision CD-SEM metrology solutions and newest e-beam lithography tool.

The company’s e-beam lithography tool delivers outstanding resolution and accuracy at high writing speeds while its CD-SEM system provides significantly improved measurement accuracy and throughput.

Also debuting are Advantest’s new terahertz systems for non-destructive package mold thickness metrology and time-domain reflectometry, offering improved productivity in semiconductor manufacturing. Advantest’s experts will be available to discuss solutions for SoC, memory, handlers and more.

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