€™s state-of-the-art TRITAN dual-lane metallization firing system features increased throughput at 3600 wafers per hour, an edge support transport system, and a temperature spike faster than three seconds. The 90 MW metallization firing system also features BTUâ€™s unique TriSpeedâ„˘ technology, allowing users to take advantage of superior ramp rates--up to 200ÂşC per second--while not compromising the drying and cooling sections of the profile. The three-belt, three-speed system provides revolutionary control of profile development.
Premiering in 2005, the Global Technology Awards program is an annual celebration of product excellence in electronics surface mount assembly. Premier products based on the finest examples of creative advancement in technology are chosen by a distinguished panel of industry experts.