Test & Measurement

EuMW 2015: Duo collaborate for on-wafer measurement solution

9th September 2015
Mick Elliott
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A joint solution for on-wafer measurements on semiconductor components has been developed by MPI and Rohde & Schwarz. The turnkey solution for measurements on semiconductor components in the RF and millimeter wave ranges achieved by a seamless integration of Rohde & Schwarz vector network analysers (VNA) and MPI engineering probe systems was demonstrated at European Microwave Week in Paris.

Due to the complex measurement tasks to be performed when characterising modern RF semiconductor components, the proper integration of T&M equipment with a probe system is a time-consuming and costly task.

To set up a measurement system delivering accurate and repeatable results can be very challenging since a number of factors play a role here. These include an intuitive user interface, the mechanical properties of the probe system, the electrical and mechanical properties of the RF probe tips, the mechanical connection and integration of the network analyser with the probe system, as well as the functionality and usability of the software.

The VNA must provide the RF performance and functionality required for complete and accurate characterisation even of demanding DUTs such as amplifiers and converters over a wide frequency range.

MPI’s engineering probe systems are characterised by excellent mechanical stability and offer unique solutions in terms of measurement repeatability and usability.

MPI recently announced the industry‘s first probe system specifically designed for high-precision measurements in the millimeter- and submillimeter-wave (THz) ranges based on a seamless integration of Rohde & Schwarz millimeter-wave converters.

The MPI TITAN RF probes provide real-time visibility of the probe tip contacts for highly accurate positioning of the probes.

MPI’s QAlibria calibration software with multitouch functionality supports the Rohde & Schwarz R&S ZVA and R&S ZNB VNAs. These offer a wide output power range for the characterisation of active components in the linear and non-linear regions.

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