Mentor Graphics and GLOBALFOUNDRIES Deliver 20nm Design Kits for Advanced Design Enablement

“Double patterning and timing closure at advanced nodes require a comprehensive suite of design tools and methodologies,” said Andy Brotman, vice president of design infrastructure at GLOBALFOUNDRIES. “Mentor solutions, including Olympus-SoC, help ensure that designs using our 20nm technologies perform and yield well by efficiently utilizing our DRC+ technology to achieve rapid manufacturing closure and avoid lengthy delays in the design cycle.”

The Olympus-SoC place and route system provides a comprehensive netlist-to-GDS flow including support for new DRC, double patterning, and DFM rules for GLOBALFOUNDRIES 20nm technology. The Olympus-SoC router has its own native coloring engine along with verification and conflict resolution engines that detect and automatically fix double patterning violations. Expanded features include DP-aware pattern matching, coloring-aware pin access, pre-coloring of critical nets, and DP-aware placement. The Calibre® InRoute™ product allows Olympus-SoC customers to natively invoke Calibre signoff engines during design for efficient and faster manufacturing closure.

“Our customers are designing some of the largest and most complex SoCs that demand high performance and lowest power at 20nm and below” said Pravin Madhani, general manager of the Place and Route group at Mentor Graphics. “Our close partnership with GLOBALFOUNDRIES ensures that our mutual customers will have the tools and reference flows needed to complete their most competitive designs to spec and on time.”