Analysis

Kilopass Receives Frost & Sullivan Award For Non-Volatile Memory Innovation

19th February 2013
ES Admin
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Kilopass Technology has announced that Frost & Sullivan awarded Kilopass the 2012 Global Technology Innovation Award in NVM. The award recognizes Kilopass Virtual Crosspoint Memory for increasing the bit density of NVM in a standard logic CMOS process by four fold. At less than half the cost of embedded or external flash with die area similar to SRAM and the flexibility of field programmability, a number of applications will benefit from VCM, from microcontrollers to touch display drivers.
“We are delighted to receive this prestigious award by Frost & Sullivan,” said Charlie Cheng, president and CEO of Kilopass Technology Inc. “The award recognizes Kilopass’s pursuit to continue to innovate in the logic NVM space. We manufactured the first logic antifuse technology in 2002 that is now in high-volume production in end products, from gaming consoles to automobiles. With VCM, we are able to expand our addressable market into embedded systems, including microcontrollers, by increasing the capacity and performance, while achieving a 4X decrease in footprint.”

For the 2012 Global Technology Innovation Award in Non-volatile Memory, Frost & Sullivan evaluated three companies offering NVM memory using five criteria: (1) uniqueness of technology, (2) impact on new products/applications, (3) impact on functionality, (4) impact on customer value, and (5) relevance of innovation to industry. Out of a possible 10 in each category, Kilopass scored 8 in the first two and last categories, and 9 in the remaining two, for a rated average of 8.8. The weighted averages for the other two companies considered for the award were 7.8 and 6.6. Kilopass was the clear choice.

“Through the VCM bit cell technology, Kilopass is offering customers the ability to enjoy high-density NVM, thus delivering increased value,” said Robin Varghese, research analyst for Frost & Sullivan's Semiconductors Group under the Measurements and Instrumentation business unit. “Its ability to cater to a wide variety of devices that are manufactured in the range between 180 nm to 20 nm makes the technology ideal for a plethora of products and new applications that require compact form, high battery life, and memory capacity.”

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