PlasmaPro System100 at University of Glasgow

14th July 2011
News Release from: Oxford Instruments
Written by : ES Admin
The James Watt Nanofabrication Centre in Glasgow, UK, has added a PlasmaPro System100 ICP plasma etch system to its existing installed base of Oxford Instruments etch and deposition tools. The PlasmaPro System100 ICP will be used to etch compound semiconductors materials used in applications such as optoelectronics, mm-wave & terahertz, bioengineering, biotechnology, lab-on-a-chip, energy harvesting and photovoltaics.
Mark Vosloo, Sales and Marketing Director at Oxford Instruments comments, “As a company Oxford Instruments is focussed on developing leading edge tools for research and development, and this additional system order for Oxford Instruments tools emphasises our commitment to providing the research equipment of choice for the University of Glasgow.”

“We have been working closely with Oxford Instruments for many years, utilising their etch and deposition systems successfully for our research.”, said Prof Douglas Paul, Professor of Semiconductor Devices and Director of the James Watt Nanofabrication Centre, “We placed this recent order for an additional Oxford Instruments system as we continue to be impressed by the tools’ flexibility and performance. We have used their tools for many years, and continue to use them to develop new etch and deposition processes for nanofabrication as we push technology below 5 nm feature sizes. In addition, maintaining our equipment is vital in order to maximise our usage and investment, and we are extremely satisfied with the consistent high levels of support we receive from Oxford Instruments”

Oxford Instruments aims to pursue responsible development and deeper understanding of our world through science and technology, using innovation to turn smart science into world-class products that support research and industry.

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