DEK takes productivity-boosting solutions to Amper 2011

17th March 2011
News Release from: DEK Northern Europe Ltd
Written by : ES Admin
DEK is preparing to take a wide range of innovative mass imaging technologies to Amper 2011, taking place from 29th March - 1st April, in the Czech Republic’s Brno Exhibition Centre.
DEK products and processes will be showcased in Hall P on stand no 170 , where a team of experts will be on hand to demonstrate to visiting manufacturers how the company can increase their yield and productivity.

Taking centre stage on the DEK stand is the Horizon 03iX platform, which has established a reputation industry-wide for providing a future-proof productivity advantage. The Horizon 03iX on show will be equipped with a variety of new and proven Productivity Tools including the Hawkeye® high-speed print verification system and Cyclone understencil cleaning technology – equipping manufacturers to cut conventional cleaning times in half for a simultaneous time and cost saving. The platform also features ProActiv, DEK’s breakthrough new process technology. Helping manufacturers rise to the challenges of increasing miniaturisation and higher board densities, ProActiv enables next-generation components to be printed alongside standard components, using only a conventional printing process with a single thickness stencil. Other Productivity Tools being showcased on the Horizon 03iX display include HD GridLok®, an automatic high-density tooling solution and Over Top Snuggers (OTS) substrate clamping technology. #
The DEK stand will also highlight the mass imaging specialist’s popular range of VectorGuard® stencil solutions, based on a unique patented automatic tensioning system. Available in a range of stencil foils, this reusable and recyclable technology prioritises operator safety, system rigidity and ease-of-use for exceptional results. Amper visitors will also have the opportunity to discover Nano-ProTek, a breakthrough fluxophobic stencil coating technology that delivers high performance stencils in a cost-effective wipe to overcome the challenges of smaller aperture sizes. DEK experts on the stand will also be showcasing a wide range of Process Improvement Products, quality consumables designed to boost manufacturers’ productivity and yield, while reducing the risk of defects and minimising rework.

Commenting on DEK’s presence at the forthcoming exhibition, DEK President, Michael Brianda, explains: “We are delighted to be attending Amper again this year, it is a great opportunity for us to showcase some of our new breakthrough technologies, such as Nano-ProTek, which really provide added value to manufacturers by maximising their equipment investment. As well as our new technologies, visitors will also be able to get their hands on proven print platforms and Productivity Tools, guided by our team of experts who will explain exactly how our advanced products and processes will help them Expect More. ”

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