Analysis

Companies partner to enable next-gen EUV lithography resist solutions

12th May 2015
Jordan Mulcare
0

JSR has signed a letter of intent to partner in enabling manufacturing and quality control of EUV lithography materials for the semiconductor industry. This partnership will be formalised by establishing a joint venture with imec as minority shareholder.

The signing ceremony was held at the Embassy of the Kingdom of Belgium in Tokyo. EUV lithography is considered as one of the main drivers to extend Moore’s law towards single digit nm technology nodes. Imec and JSR’s collaboration, will allow both companies to leverage their strengths when developing photoresist solutions for the semiconductor industry to manufacture the most advanced devices.

JSR will provide manufacturing technology to the joint venture including upgrading the facility at its wholly-owned subsidiary in Belgium, JSR Micro NV, by installing manufacturing and analytical equipment. Imec will provide expertise and services to the joint venture for quality control on materials. In addition to the manufacturing of JSR brand photoresists, the joint venture will offer toll-manufacturing capability to other material suppliers with confidentiality secured.

“JSR has been a strategic partner of imec for a long time and I am excited with this intensified collaboration,” stated Luc Van den hove, President and CEO, imec. “This collaboration strengthens our supplier hub concept, a neutral open innovation R&D platform that involves suppliers more deeply and at an early stage of process step and module development. The partnership enabled through close proximity between the JSR manufacturing facility and the imec technology platform will allow our partners to gain access to best-in-class materials for next-gen technologies.”

Product Spotlight

Upcoming Events

View all events
Newsletter
Latest global electronics news
© Copyright 2024 Electronic Specifier