i-line filters, photolithography process, Laser Components

New range of interference filters for photolithography

News Release from: LASER COMPONENTS (UK) Ltd
23 September 2011

LASER COMPONENTS can now offer filters, which are specifically designed for the photolithography process. These bandpass filters produce a high performance result, which resolves monochromatic wavelengths reaching the photo mask substrate so that optimum resolution is achievable.

Working with our partners at Omega Optical, we can produce a filter that efficiently transmits the five lines of the fine structure of the Mercury i-line with bandwidth, centre wavelength, and filter construction designed to allow maximum throughput. Custom and standard designs are available.

These filters are now produced using our Dual Magnetron Reactive Sputtering process, which allows us to achieve very precise individual layer thickness and a high degree of predictability and batch-to-batch repeatability.
The new i-line filters feature greatly improved i-line intensity delivered to the resist, surpassing the standard OEM filters. Our standard range features 0.6nm centre wavelengths whilst producing >90% peak transmission, the typical lifetime is in excess of 10,000 hours